The Sub Micron Level Coating Demand Vs Challenges
There are many industrial needs for submicron level coating, like in photolithography. Especially in the branch of nanotechnology, that deals with printing designs at the microscopic level for nanochips and processors. Where new micro fabrication techniques are engineering thin film coatings, using various materials, at the nanometer-scale. In more simpler terms, these coatings are being demanded in the range of 10⁻⁹ to 10⁻⁶ meters. Here spin coater instruments have been finding high demand from research institutes and industrial labs. However, as demand for ultra thin gadgets (that use ultra thin nano processors) is rising, there are new challenges at unknown levels of 3nm and below.
But if are new to the field of nanolithography, or as mentioned above, printing on the nanoscale – you will probably not realize the challenges of uniform deposition of various material like pyrites to create these micro structures.
However, if you are from the R&D field of electronics manufacturing, you will realise how small you want your nanochips and processors to be, to stay competitive in the market and get that new product working in best conditions.
Extreme ultraviolet (EUV) lithography
Now new demands are rising in the industry for next generation extreme ultraviolet (EUV) lithography. And these printing demand are for nanoscales of 3nm and beyond. However, it is easier said than done. Where traditional EUV production is at 5nm to 7nm levels, industry has already started asking for 1nm levels. And therein lies the challenges. Right from highly expensive fabrications systems to reliability concerns at those levels.
Spin Coating Vs Dry photoresist
As mentioned above, researchers are exploring newer means of EUV depositions. One of them is dry photoresist processing (DPP) that is claimed to have lower wastages than spin coating processes. The downside that strikes hardest is expected to be affordability. So spin coating method, as you can see, is thus very commonly used process in laboratory settings in leading institutes and companies at both the national and international level. The cost vs efficiency vs ease of use.
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